Abstract：In this paper, titanium nitride films were deposited by magnetron sputtering.The phase structure, surface morphology, nano-hardness, elastic modulus and residual stress of the films were respectively investigated with X-ray diffraction (XRD) , field emission scanning electron microscopy (FESEM) , atomic force microscopy (AFM) and nano-indentation instrument.The influences of the thin film preparation parameters, such as substrate temperature, sputtering power and substrate bias, were discussed.The results show that the titanium nitride films are polycrystalline.And the morphology, structure and performance of the films are complexly influenced by the sputtering power, substrate negative bias voltage and substrate temperature.

Keyword：magnetron sputtering;titanium nitride;film;